To be held in conjunction with the 24th International Conference on Pattern Recognition ICPR 2018, August 20th, 2018. Beijing, China
Deep Learning, which can be treated as the most significant breakthrough in the past 10 years in the field of pattern recognition and machine learning, has greatly affected the methodology of related fields like computer vision and achieved terrific progress in both academy and industry. It can be seen as a resolution to change the whole pattern recognition system. It achieved an end-to-end pattern recognition, merging the previous steps of pre-processing, feature extraction, classifier design and post-processing. It is expected that the development of deep learning theories and applications would further influence the field of pattern recognition. The deep learning technique has been widely used in face analysis, biometrics, object recognition, document analysis, scene understanding and etc. The purpose of this workshop is to bring together researchers who are working on developing deep learning and pattern recognition to report or exchange their progresses on deep learning for pattern recognition. The major goal of this workshop is to provide a platform for researchers or graduate students around the world to report or exchange their progresses on deep learning for pattern recognition.
We call for both regular paper submissions to the workshop and poster submissions for exhibitions following the Vision And Learning SEminar (VALSE) fashion.